As semiconductors become increasingly complex and single nano design nodes, OEMs require highly specialized materials with advanced properties capable of withstanding the harsh conditions of semiconductor manufacturing. The drive for miniaturization and enhanced performance continues to augment the intensity of a range of semiconductor fabrication methods. Accordingly, all materials used in assembly and processing must sustain integrity through production and the extended use of their respective applications.
Syensqo's specialty PFPE materials provide OEMs with the performance properties required for today’s most innovative semiconductor processes and applications to drive the progression of the modern semiconductor industry. Specifically, Fomblin® PFPE is a specialty perfluorinated polyether inert fluid and optimal for use as a lubricant in vacuum pumps. Additionally, Galden® HT PFPE fluids are inert, dielectric, heat transfer fluids widely used in semiconductor manufacturing processes.
High-Performance Vacuum Pump Oil for Semiconductor Fabrication
As the semiconductor industry trends toward single nano design rule and multi-stack 3D NAND flash, typical temperatures for semiconductor fabrication processes continue to rise. To avoid the side effect during the production of semiconductor fabrication, modern vacuum pumps need to operate at extremely high temperatures. Vacuum pump components must be able to tolerate these conditions, and OEMs demand materials with low vapor pressure to avoid contamination of the cleanroom, high thermal resistance, high chemical resistance and high oxidative stability.
Fomblin® PFPE fluids offer the ideal mixture of fluorinated polymers containing only carbon, fluorine and oxygen atoms, which facilitates critical performance properties, such as low vapor pressure, chemical inertness and high thermal stability. Additionally, these chemically stable lubricants exhibit a high viscosity index; excellent compatibility with metals, plastics and elastomers; high dielectric properties and are both non-flammable and non-toxic. This range of unique properties makes Fomblin® PFPE extremely well-suited for numerous vacuum pump oils for applications in semiconductor wafer fabrication. Fomblin® PFPE is an optimal material choice for processes including scanning electron microscopy (SEM) and transmission electron microscopy (TEM), dry etching, CVD and physical vapor deposition (PVD). Its chemical inertness and intrinsic properties enable safe and effective usage with reactive gases such as UF6, F2, oxygen, ozone, and tritium.
Exceptional Heat Transfer Fluid for Semiconductor Manufacturing
The rise in wafer fabrication temperatures in semiconductor manufacturing requires high-performance fluids with a range of advanced properties. Additionally, the demanding thermal environment of vapor deposition processes during fabrication necessitates fluids that avoid excess pressure in the heat transfer circuit, reduce fluid loss and reduce cavitation. OEMs must utilize materials with exceptionally high boiling points to mitigate evaporation, and these products must also be safe to use with aggressive chemicals and reactive gases.
Galden® HT PFPE fluids are inert, dielectric heat transfer fluids with boiling points ranging from 55°C (131°F) to 270°C (518°F). These thermal fluids and high boiling grades can replace liquids with higher evaporation rates, which reduces cost in semiconductor fabrication. As Galden® HT PFPE fluids are chemically inert and non-flammable, these fluids are exceptionally suitable for solvents used in cleaning applications.
With a dynamic range of excellent performance properties, Galden® HT PFPE fluids are widely utilized to improve semiconductor manufacturing processes such as dry etching, CVD and PVD. Additionally, Galden® HT PFPE are the materials of choice for vapor phase soldering (VPS), where semiconductor chips are mounted on printed circuit boards (PCBs). The thermal and chemical stability, diverse compatibility and good heat transfer properties of Galden® heat exchange fluids eliminate the concern of corrosion or dangerous reactions and simultaneously improve semiconductor processing efficiency.
